CAS 908831-34-5 | Di-iso-propylaminosilane
Product Name: Di-iso-propylaminosilane
Synonym: DIPAS, N,N-Bis(1-methylethyl)silanamine, Diisopropylaminosilane
CAS Number: 908831-34-5
Molecular Formula: C₆H₁₇NSi
Molecular Weight: 131.29 g/mol
Purity: ≥ 99.9% (electronic grade); ≥ 99.9999% (ultra-high purity)
Boiling Point: 115–140.7 °C (760 Torr)
Viscosity: Not applicable (liquid precursor)
Appearance: Colorless transparent liquid
Packaging: 100 g / 1 kg / 25 kg / custom
Lead Time: 3–7 business days from stock
Made in China | COA & SDS provided with every shipment
- Worldwide Delivery
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Product Introduction
Di-iso-propylaminosilane (DIPAS, CAS 908831-34-5) | Chlorine-Free ALD/CVD Precursor | China-Based Manufacturer
✅ Response within 12 hours · 📄 COA & SDS with every shipment
For R&D and industrial use only. Not for pharmaceutical, food, or cosmetic applications without specific regulatory compliance testing.
Product Overview: DIPAS (CAS 908831-34-5)
Di-iso-propylaminosilane (DIPAS, CAS 908831-34-5) is a mono(alkylamino)silane precursor with the molecular formula C₆H₁₇NSi and a molecular weight of 131.29 g/mol. It appears as a colorless, transparent liquid with an organic amine odor. Its molecular structure consists of a silicon atom bonded to three hydride groups and one diisopropylamino ligand (SiH₃N(i-Pr)₂).
Within the aminosilane precursor family, DIPAS occupies an intermediate position - its single amino ligand bearing two isopropyl groups provides a balanced combination of volatility, reactivity, and chemoselectivity that distinguishes it from both smaller-ligand variants such as dimethylaminosilane (DMAS) and bulkier bis- or tris-aminosilanes such as bis(diethylamino)silane (BDEAS) and tris(dimethylamino)silane (TDMAS)[reference:1]. This balance has driven its adoption in both thermal and plasma-enhanced ALD processes.
Alfa Chemical supplies DIPAS from our Zhengzhou facility. The product is available in electronic grade with purity ≥99.9% and ultra-high purity grade with assay up to 99.9999%. Metal impurities are controlled at ppb levels. Each batch includes a Certificate of Analysis covering assay, metal impurities, and water content.
Industrial Applications of DIPAS
Four application areas where DIPAS is specified for its chlorine-free deposition chemistry and balanced precursor properties.
DIPAS is widely used for depositing chlorine-free ultra-thin conformal silicon nitride and silicon oxide barrier layers in advanced semiconductor processes of 3nm and below. Its amino ligands are mild and easy to remove, enabling excellent low-temperature thermal decomposition and superior film step coverage without chloride contamination[reference:2].
Request a sample →Used in CVD processes for fabricating SiO₂, SiNₓ, and SiC thin films. DIPAS serves as an eco-friendly chlorine-free silicon source to replace traditional chlorosilanes, reducing corrosion risk and improving film quality[reference:3][reference:4].
Get technical data →Used in the fabrication of passivation films for flexible displays and RF devices. The chlorine-free deposition process avoids chloride-induced degradation, extending device lifetime and improving performance[reference:5].
Request technical data →DIPAS is used as an essential etch layer material for pattern formation in the Double Patterning Technology process, working together with photoresist to achieve finer line widths in advanced circuit fabrication[reference:6].
Request a quote →Technical Specifications: DIPAS
Identity, quality, and physical parameters for our standard DIPAS grade. Electronic grade and ultra-high purity options are available.
| Item | Specification |
|---|---|
| Product Name | Di-iso-propylaminosilane |
| Synonyms | DIPAS; N,N-Bis(1-methylethyl)silanamine; Diisopropylaminosilane |
| CAS Number | 908831-34-5 |
| EC Number | 640-373-2 |
| Molecular Formula | C₆H₁₇NSi |
| Molecular Weight | 131.29 g/mol |
| Appearance | Colorless transparent liquid |
| Purity | ≥ 99.9% (electronic grade); ≥ 99.9999% (ultra-high purity) |
| Boiling Point | 115 – 140.7 °C (760 Torr) |
| Density | ~0.76 g/cm³ (20 °C) |
| Flash Point | 38.9 ± 22.6 °C |
| Solubility | Miscible in saturated hydrocarbons and aromatics |
| Water Reactivity | Violent reaction - releases flammable gases |
| Storage | Cool, dry, well-ventilated; inert gas atmosphere; ≤51 °C |
| Packaging | 100 g / 1 kg / 25 kg / custom |
Quality Documentation: COA & SDS for DIPAS
Manufacturing and Quality Control: DIPAS Production in Zhengzhou, China
Our DIPAS production line operates under documented SOPs, with in-house testing for purity by GC, metal impurities by ICP-MS, and water content by Karl Fischer titration. Metal impurities are controlled at ppb levels - Al, Ca, Cu, Fe, K, Na, and other metals are each ≤75 ppb in electronic grade material[reference:7]. Retained samples from every batch are kept for traceability.
The facility is ISO 9001 certified and has supplied organosilicon precursors and electronic chemicals for more than a decade. More on our manufacturing →
Packaging, Shipping, and Lead Time
Standard packaging and shipping terms for DIPAS orders. Sealed stainless steel containers and inert gas packaging are available.
100 g / 1 kg / 25 kg, sealed stainless steel containers and custom packaging available.
FedEx / DHL for samples; air or sea freight for bulk orders. Inert gas packaging available.
3–7 business days from stock; bulk orders negotiable.
COA and SDS provided with every shipment.
For special packaging or urgent timelines, contact our team.
Why Choose Alfa Chemical as Your DIPAS Supplier
Focused on organosilicon precursors and high-purity materials.
Batch-traceable COA covering assay, metal impurities, and water content.
100g for R&D, 25kg bulk for production.
Direct from Zhengzhou, China. No trading layer.
Browse more photoelectric materials or send us a custom request.
Frequently Asked Questions: DIPAS (CAS 908831-34-5)
DIPAS has a single amino ligand with two isopropyl groups, while BDEAS has two diethylamino ligands. DIPAS offers a different balance of volatility and reactivity, with a lower molecular weight and higher silicon content per molecule.
Yes. DIPAS is a chlorine-free silicon precursor, which eliminates the risk of chloride contamination in deposited films - a key advantage for advanced semiconductor manufacturing.
Electronic grade (≥99.9%) and ultra-high purity grade (up to 99.9999%). Metal impurities are controlled at ppb levels. The COA reports actual batch values.
Store in a cool, dry, well-ventilated area under inert gas (N₂). Keep temperature ≤51°C. Avoid contact with water, oxidants, acids, and bases. Use sealed stainless steel containers.
Yes, with every shipment. Batch-specific documents are available on request.
100 g, 1 kg, 25 kg. Sealed stainless steel containers and inert gas packaging available on request.
3–7 business days from stock. Bulk orders negotiable.
Yes, samples are available. Buyer covers shipping.
Response within 12 hours. COA & SDS with every shipment.
Related products & resources:
Alfa Chemical Co., Ltd is based in Zhengzhou, China. All product specifications are for reference only. Users should conduct their own suitability tests under actual conditions. Products are for R&D and industrial use only. Not for pharmaceutical, food, or cosmetic applications without specific regulatory compliance testing. Last updated: 2026-09-29.
Hot Tags: cas 908831-34-5 | di-iso-propylaminosilane, price, quotation, discount, in stock, for sale, Aggregation Induced Emission
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